Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides: Fid-Bau Portal

Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides

Zhang, L. / Xie, W. / Wang, J. / Li, A. / Xing, H. / Zheng, W. / Zhang, Y.

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Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides

Zhang, L. / Xie, W. / Wang, J. / Li, A. / Xing, H. / Zheng, W. / Zhang, Y.

Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides

Zhang, L. / Xie, W. / Wang, J. / Li, A. / Xing, H. / Zheng, W. / Zhang, Y.

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Access via TIB

Check availability in my library

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Document information

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Document information

Title:

Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides

Contributors:

Zhang, L. (author) / Xie, W. (author) / Wang, J. (author) / Li, A. (author) / Xing, H. (author) / Zheng, W. (author) / Zhang, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 228 ; 48-52

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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