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In Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films
In Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films
In Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films
Martins, R. M. S. (Autor:in) / Silva, R. J. C. (Autor:in) / Fernandes, F. M. B. (Autor:in) / Pereira, L. (Autor:in) / Gordo, P. R. (Autor:in) / Maneira, M. J. P. (Autor:in) / Schell, N. (Autor:in)
MATERIALS SCIENCE FORUM ; 455/456 ; 342-345
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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