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Industrial application of pulsed dc bias power supplies in closed field unbalanced magnetron sputter ion plating

Cooke, K. E. / Hampshire, J. / Southall, W. / Teer, D. G.

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Industrial application of pulsed dc bias power supplies in closed field unbalanced magnetron sputter ion plating

Cooke, K. E. / Hampshire, J. / Southall, W. / Teer, D. G.

Industrial application of pulsed dc bias power supplies in closed field unbalanced magnetron sputter ion plating

Cooke, K. E. / Hampshire, J. / Southall, W. / Teer, D. G.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Dokumentinformationen

Ähnliche Titel

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Dokumentinformationen

Titel:

Industrial application of pulsed dc bias power supplies in closed field unbalanced magnetron sputter ion plating

Beteiligte:

Cooke, K. E. (Autor:in) / Hampshire, J. (Autor:in) / Southall, W. (Autor:in) / Teer, D. G. (Autor:in)

Erschienen in:

SURFACE ENGINEERING -LONDON-. ; 20 ; 189-195

Erscheinungsdatum:

01.01.2004

Format / Umfang:

7 pages

ISSN:

0267-0844

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.44

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