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    Industrial application of pulsed dc bias power supplies in closed field unbalanced magnetron sputter ion plating

    New search for: Cooke, K. E.
    New search for: Hampshire, J.
    New search for: Southall, W.
    New search for: Teer, D. G.

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    Industrial application of pulsed dc bias power supplies in closed field unbalanced magnetron sputter ion plating

    New search for: Cooke, K. E.
    New search for: Hampshire, J.
    New search for: Southall, W.
    New search for: Teer, D. G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Industrial application of pulsed dc bias power supplies in closed field unbalanced magnetron sputter ion plating

    New search for: Cooke, K. E.
    New search for: Hampshire, J.
    New search for: Southall, W.
    New search for: Teer, D. G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Industrial application of pulsed dc bias power supplies in closed field unbalanced magnetron sputter ion plating

    Contributors:

    Cooke, K. E. (author) / Hampshire, J. (author) / Southall, W. (author) / Teer, D. G. (author)

    Published in:

    SURFACE ENGINEERING -LONDON-. ; 20 ; 189-195

    Publication date:

    2004-01-01

    Size:

    7 pages

    ISSN:

    0267-0844

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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