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Defect study on Nanoglass E porous ultra-low k material (k2.2) for ultra-large-scale integration applications
Defect study on Nanoglass E porous ultra-low k material (k2.2) for ultra-large-scale integration applications
Defect study on Nanoglass E porous ultra-low k material (k2.2) for ultra-large-scale integration applications
Zhang, L. (Autor:in) / Chen, Y. W. (Autor:in) / Li, C. Y. (Autor:in) / Li, C. (Autor:in) / Wong, L. Y. (Autor:in) / Li, H. Y. (Autor:in) / Balakumar, S. (Autor:in) / Park, H. S. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 89-93
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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