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Defect study on Nanoglass E porous ultra-low k material (k2.2) for ultra-large-scale integration applications
Defect study on Nanoglass E porous ultra-low k material (k2.2) for ultra-large-scale integration applications
Defect study on Nanoglass E porous ultra-low k material (k2.2) for ultra-large-scale integration applications
Zhang, L. (author) / Chen, Y. W. (author) / Li, C. Y. (author) / Li, C. (author) / Wong, L. Y. (author) / Li, H. Y. (author) / Balakumar, S. (author) / Park, H. S. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 89-93
2004-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
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