Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition
Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition
Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition
Chang, T. Y. ( Autor:in ) / Tze, J. J. ( Autor:in ) / Tsai, D. S. ( Autor:in )
APPLIED SURFACE SCIENCE ; 236 ; 165-174
01.01.2004
10 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Growth mode during initial stage of chemical vapor deposition
British Library Online Contents | 2005
|Chemical deposition and characterization of copper indium disulphide thin films
British Library Online Contents | 2004
|Synthesis of indium-catalyzed Si nanowires by hot-wire chemical vapor deposition
British Library Online Contents | 2011
|Chemical Vapor Deposition of Copper for Multilevel Metallization
British Library Online Contents | 1993
|Chemical deposition and characterization of copper indium diselenide (CISe) thin films
British Library Online Contents | 2005
|