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Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition

Chang, T. Y. / Tze, J. J. / Tsai, D. S.

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Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition

Chang, T. Y. / Tze, J. J. / Tsai, D. S.

Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition

Chang, T. Y. / Tze, J. J. / Tsai, D. S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition

Contributors:

Chang, T. Y. (author) / Tze, J. J. (author) / Tsai, D. S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 236 ; 165-174

Publication date:

2004-01-01

Size:

10 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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