Boron activation and redistribution during thermal treatments after solid phase epitaxial regrowth

Aboy, M. / Pelaz, L. / Barbolla, J. et al. | British Library Online Contents | 2005

Effects of crystalline regrowth on dopant profiles in preamorphized silicon

Hopstaken, M. J. P. / Tamminga, Y. / Verheijen, M. A. et al. | British Library Online Contents | 2004

Effect of germanium pre-amorphization on solid-phase epitaxial regrowth of antimony and arsenic ion-implanted silicon

Ghanad Tavakoli, S. / Baek, S. / Hwang, H. | British Library Online Contents | 2004

Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation

Kang, M.-Y. / Yamamoto, T. / Matsui, T. et al. | British Library Online Contents | 1996

Dopant redistribution during the formation of iron silicides

Erlesand, U. / Oestling, M. | British Library Online Contents | 1993