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Study of electrical and structural properties of boron doped polysilicon films with a low nitrogen content
Study of electrical and structural properties of boron doped polysilicon films with a low nitrogen content
Study of electrical and structural properties of boron doped polysilicon films with a low nitrogen content
Bouridah, H. (Autor:in) / Mansour, F. (Autor:in) / Mahamdi, R. (Autor:in) / Temple-Boyer, P. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 40 ; 1405-1408
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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