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Tight-binding quantum chemical molecular dynamics simulation of boron activation process in crystalline silicon
Tight-binding quantum chemical molecular dynamics simulation of boron activation process in crystalline silicon
Tight-binding quantum chemical molecular dynamics simulation of boron activation process in crystalline silicon
Masuda, T. (Autor:in) / Sasata, K. (Autor:in) / Elanany, M. (Autor:in) / Koyama, M. (Autor:in) / Kubo, M. (Autor:in) / Miyamoto, A. (Autor:in)
APPLIED SURFACE SCIENCE ; 244 ; 30-33
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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