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Growth and characterization of Zn1-xCdxO films using remote plasma MOCVD
Growth and characterization of Zn1-xCdxO films using remote plasma MOCVD
Growth and characterization of Zn1-xCdxO films using remote plasma MOCVD
Ishihara, J. (Autor:in) / Nakamura, A. (Autor:in) / Shigemori, S. (Autor:in) / Aoki, T. (Autor:in) / Temmyo, J. (Autor:in)
APPLIED SURFACE SCIENCE ; 244 ; 381-384
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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