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Growth and characterization of Zn1-xCdxO films using remote plasma MOCVD

Ishihara, J. / Nakamura, A. / Shigemori, S. / Aoki, T. / Temmyo, J.

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Growth and characterization of Zn1-xCdxO films using remote plasma MOCVD

Ishihara, J. / Nakamura, A. / Shigemori, S. / Aoki, T. / Temmyo, J.

Growth and characterization of Zn1-xCdxO films using remote plasma MOCVD

Ishihara, J. / Nakamura, A. / Shigemori, S. / Aoki, T. / Temmyo, J.

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Check availability in my library

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Document information

Title:

Growth and characterization of Zn1-xCdxO films using remote plasma MOCVD

Contributors:

Ishihara, J. (author) / Nakamura, A. (author) / Shigemori, S. (author) / Aoki, T. (author) / Temmyo, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 244 ; 381-384

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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