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Boron diffusion in presence of defects induced by helium implantation
Boron diffusion in presence of defects induced by helium implantation
Boron diffusion in presence of defects induced by helium implantation
Cayrel, F. (Autor:in) / Alquier, D. (Autor:in) / Dubois, C. (Autor:in) / Jerisian, R. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 271-274
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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