Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon: Fid-Bau Portal

Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon

Goux, L. / Gervais, M. / Gervais, F. / Champeaux, C. / Catherinot, A.

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Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon

Goux, L. / Gervais, M. / Gervais, F. / Champeaux, C. / Catherinot, A.

Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon

Goux, L. / Gervais, M. / Gervais, F. / Champeaux, C. / Catherinot, A.

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Titel:

Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon

Beteiligte:

Goux, L. (Autor:in) / Gervais, M. (Autor:in) / Gervais, F. (Autor:in) / Champeaux, C. (Autor:in) / Catherinot, A. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 252 ; 3085-3091

Erscheinungsdatum:

01.01.2006

Format / Umfang:

7 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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