Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon: Fid-Bau Portal

Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon

Goux, L. / Gervais, M. / Gervais, F. / Champeaux, C. / Catherinot, A.

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Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon

Goux, L. / Gervais, M. / Gervais, F. / Champeaux, C. / Catherinot, A.

Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon

Goux, L. / Gervais, M. / Gervais, F. / Champeaux, C. / Catherinot, A.

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Title:

Strongly oriented BST films on La0.9Sr1.1NiO4 electrodes deposited on various substrates for integration of high capacitances on silicon

Contributors:

Goux, L. (author) / Gervais, M. (author) / Gervais, F. (author) / Champeaux, C. (author) / Catherinot, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 252 ; 3085-3091

Publication date:

2006-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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