Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Comparing study of subpicosecond and nanosecond wet etching of fused silica
APPLIED SURFACE SCIENCE ; 252 ; 4768-4772
01.01.2006
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Subpicosecond laser ablation of copper and fused silica: Initiation threshold and plasma expansion
British Library Online Contents | 2009
|Backside etching of fused silica with Nd:YAG laser
British Library Online Contents | 2006
|Indirect laser etching of fused silica: Towards high etching rate processing
British Library Online Contents | 2007
|Deposition of Er:YAG (YAP) layers by subpicosecond and nanosecond KrF excimer laser ablation
British Library Online Contents | 2002
|Precise etching of fused silica for micro-optical applications
British Library Online Contents | 2005
|