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Growth of highly c-axis oriented aluminum nitride thin films on β-tantalum bottom electrodes
Growth of highly c-axis oriented aluminum nitride thin films on β-tantalum bottom electrodes
Growth of highly c-axis oriented aluminum nitride thin films on β-tantalum bottom electrodes
Akiyama, M. (Autor:in) / Ueno, N. (Autor:in) / Nagao, K. (Autor:in) / Yamada, T. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 41 ; 4691-4694
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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British Library Online Contents | 2005
|Effect of Tantalum in Sublimation Growth of Aluminum Nitride
British Library Online Contents | 2003
|Reactive sputter deposition and characterization of tantalum nitride thin films
British Library Online Contents | 1999
|Film thickness effects on the fracture of tantalum nitride on aluminum nitride thin film systems
British Library Online Contents | 1998
|Growth mechanism of reactively sputtered aluminum nitride thin films
British Library Online Contents | 2002
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