Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Alloying process of sputter-deposited Ti/Ni multilayer thin films
Alloying process of sputter-deposited Ti/Ni multilayer thin films
Alloying process of sputter-deposited Ti/Ni multilayer thin films
Cho, H. (Autor:in) / Kim, H. Y. (Autor:in) / Miyazaki, S. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING A ; 438-440 ; 699-702
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Reactive phase formation in sputter-deposited Ni/Al multilayer thin films
British Library Online Contents | 1997
|Hardness of sputter deposited nanocrystalline Ni3Al thin films
British Library Online Contents | 2007
|Reactively sputter-deposited Mo-Ox-Ny thin films
British Library Online Contents | 2002
|Direct current magnetron sputter-deposited ZnO thin films
British Library Online Contents | 2011
|Chemical passivation of sputter-deposited nanocrystalline CdS thin films
British Library Online Contents | 2002
|