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Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
Prabhu, V. M. (Autor:in) / Sambasivan, S. (Autor:in) / Fischer, D. (Autor:in) / Sundberg, L. K. (Autor:in) / Allen, R. D. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 1010-1014
01.01.2006
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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