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Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
Prabhu, V. M. (author) / Sambasivan, S. (author) / Fischer, D. (author) / Sundberg, L. K. (author) / Allen, R. D. (author)
APPLIED SURFACE SCIENCE ; 253 ; 1010-1014
2006-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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