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4.3 mOmegacm^2, 1100 V 4H-SiC Implantation and Epitaxial MOSFET
4.3 mOmegacm^2, 1100 V 4H-SiC Implantation and Epitaxial MOSFET
4.3 mOmegacm^2, 1100 V 4H-SiC Implantation and Epitaxial MOSFET
Harada, S. (Autor:in) / Kato, M. (Autor:in) / Okamoto, M. (Autor:in) / Yatsuo, T. (Autor:in) / Fukuda, K. (Autor:in) / Arai, K. (Autor:in) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
Silicon Carbide and Related Materials - 2005 ; 1281-1284
MATERIALS SCIENCE FORUM ; 527/529
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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