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Properties of dc magnetron sputtered Cu2O films prepared at different sputtering pressures
Properties of dc magnetron sputtered Cu2O films prepared at different sputtering pressures
Properties of dc magnetron sputtered Cu2O films prepared at different sputtering pressures
Reddy, A. S. (Autor:in) / Uthanna, S. (Autor:in) / Reddy, P. S. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 5287-5292
01.01.2007
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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