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    Properties of dc magnetron sputtered Cu2O films prepared at different sputtering pressures

    New search for: Reddy, A. S.
    New search for: Uthanna, S.
    New search for: Reddy, P. S.

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    Properties of dc magnetron sputtered Cu2O films prepared at different sputtering pressures

    New search for: Reddy, A. S.
    New search for: Uthanna, S.
    New search for: Reddy, P. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Properties of dc magnetron sputtered Cu2O films prepared at different sputtering pressures

    New search for: Reddy, A. S.
    New search for: Uthanna, S.
    New search for: Reddy, P. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Properties of dc magnetron sputtered Cu2O films prepared at different sputtering pressures

    Contributors:

    Reddy, A. S. (author) / Uthanna, S. (author) / Reddy, P. S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 253 ; 5287-5292

    Publication date:

    2007-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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