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The Characteristic of As-Grown and Post-Annealed Nitrogen Doped Amorphous Carbon Thin Films Deposited by Surface Wave Microwave Plasma Enhanced Chemical Vapor Deposition Method
The Characteristic of As-Grown and Post-Annealed Nitrogen Doped Amorphous Carbon Thin Films Deposited by Surface Wave Microwave Plasma Enhanced Chemical Vapor Deposition Method
The Characteristic of As-Grown and Post-Annealed Nitrogen Doped Amorphous Carbon Thin Films Deposited by Surface Wave Microwave Plasma Enhanced Chemical Vapor Deposition Method
Rusop, M. (Autor:in) / Abdullah, S. (Autor:in) / Adhikari, S. (Autor:in) / Omer, A. M. M. (Autor:in) / Soga, T. (Autor:in) / Jimbo, T. (Autor:in) / Umeno, M. (Autor:in)
SURFACE REVIEW AND LETTERS ; 13 ; 593-598
01.01.2006
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
530.417
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Carbon Nanowalls Grown by Microwave Plasma Enhanced Chemical Vapor Deposition
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