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Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells
Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells
Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells
Liang, H. (Autor:in) / Gordon, R. G. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 42 ; 6388-6399
01.01.2007
12 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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