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    Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells

    New search for: Liang, H.
    New search for: Gordon, R. G.

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    Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells

    New search for: Liang, H.
    New search for: Gordon, R. G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells

    New search for: Liang, H.
    New search for: Gordon, R. G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells

    Contributors:

    Liang, H. (author) / Gordon, R. G. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 42 ; 6388-6399

    Publication date:

    2007-01-01

    Size:

    12 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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