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Fabrication of 550nm gratings in fused silica by laser induced backside wet etching technique
Fabrication of 550nm gratings in fused silica by laser induced backside wet etching technique
Fabrication of 550nm gratings in fused silica by laser induced backside wet etching technique
APPLIED SURFACE SCIENCE ; 253 ; 8059-8063
01.01.2007
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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