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Sloped Sidewalls in 4H-SiC Mesa Structure Formed by a Cl~2-O~2 Thermal Etching
Sloped Sidewalls in 4H-SiC Mesa Structure Formed by a Cl~2-O~2 Thermal Etching
Sloped Sidewalls in 4H-SiC Mesa Structure Formed by a Cl~2-O~2 Thermal Etching
Takenami, S. (Autor:in) / Hatayama, T. (Autor:in) / Yano, H. (Autor:in) / Uraoka, Y. (Autor:in) / Fuyuki, T. (Autor:in) / Wright, N. / Johnson, C. M. / Vassilevski, K. / Nikitina, I. / Horsfall, A.
01.01.2007
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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