Structural study of nanoporous ultra low-k dielectrics using complementary techniques: Ellipsometric porosimetry, X-ray reflectivity and grazing incidence small-angle X-ray scattering: Fid-Bau Portal

Structural study of nanoporous ultra low-k dielectrics using complementary techniques: Ellipsometric porosimetry, X-ray reflectivity and grazing incidence small-angle X-ray scattering

Jousseaume, V. / Rolland, G. / Babonneau, D. / Simon, J. P.

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Structural study of nanoporous ultra low-k dielectrics using complementary techniques: Ellipsometric porosimetry, X-ray reflectivity and grazing incidence small-angle X-ray scattering

Jousseaume, V. / Rolland, G. / Babonneau, D. / Simon, J. P.

Structural study of nanoporous ultra low-k dielectrics using complementary techniques: Ellipsometric porosimetry, X-ray reflectivity and grazing incidence small-angle X-ray scattering

Jousseaume, V. / Rolland, G. / Babonneau, D. / Simon, J. P.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

Exportieren, teilen und zitieren

Dokumentinformationen

Titel:

Structural study of nanoporous ultra low-k dielectrics using complementary techniques: Ellipsometric porosimetry, X-ray reflectivity and grazing incidence small-angle X-ray scattering

Beteiligte:

Jousseaume, V. (Autor:in) / Rolland, G. (Autor:in) / Babonneau, D. (Autor:in) / Simon, J. P. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 254 ; 473-479

Erscheinungsdatum:

01.01.2007

Format / Umfang:

7 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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