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Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition
Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition
Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition
Tseng, Y. T. (Autor:in) / Tseng, W. H. (Autor:in) / Lin, C. H. (Autor:in) / Ho, R. M. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 19 ; 3584-3588
01.01.2007
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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