Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition: Fid-Bau Portal

Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition

Tseng, Y. T. / Tseng, W. H. / Lin, C. H. / Ho, R. M.

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Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition

Tseng, Y. T. / Tseng, W. H. / Lin, C. H. / Ho, R. M.

Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition

Tseng, Y. T. / Tseng, W. H. / Lin, C. H. / Ho, R. M.

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Check availability in my library

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Document information

Title:

Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition

Contributors:

Tseng, Y. T. (author) / Tseng, W. H. (author) / Lin, C. H. (author) / Ho, R. M. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 19 ; 3584-3588

Publication date:

2007-01-01

Size:

5 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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