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Ultra-Large Area RF Plasma Sources Employing Multiple Low-Inductance Internal-Antenna Modules for Flat Panel Display Processing
Ultra-Large Area RF Plasma Sources Employing Multiple Low-Inductance Internal-Antenna Modules for Flat Panel Display Processing
Ultra-Large Area RF Plasma Sources Employing Multiple Low-Inductance Internal-Antenna Modules for Flat Panel Display Processing
Setsuhara, Y. (Autor:in) / Takenaka, K. (Autor:in) / Tsukiyama, D. (Autor:in) / Nishisaka, K. (Autor:in) / Ebe, A. (Autor:in) / Chang, Y.W. / Kim, N.J. / Lee, C.S.
01.01.2007
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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