Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process
Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process
Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process
Askari, S.J. (Autor:in) / Lu, F. (Autor:in)
SURFACE ENGINEERING -LONDON- ; 23 ; 350-354
01.01.2007
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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