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    Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process

    New search for: Askari, S.J.
    New search for: Lu, F.

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    Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process

    New search for: Askari, S.J.
    New search for: Lu, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process

    New search for: Askari, S.J.
    New search for: Lu, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process

    Contributors:

    Askari, S.J. (author) / Lu, F. (author)

    Published in:

    SURFACE ENGINEERING -LONDON- ; 23 ; 350-354

    Publication date:

    2007-01-01

    Size:

    5 pages

    ISSN:

    0267-0844

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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