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Effect of substrate temperature variation on nanostructured WC films prepared using HFCVD technique
Effect of substrate temperature variation on nanostructured WC films prepared using HFCVD technique
Effect of substrate temperature variation on nanostructured WC films prepared using HFCVD technique
Yang, B. Q. (Autor:in) / Wang, X. P. (Autor:in) / Zhang, H. X. (Autor:in) / Wang, Z. B. (Autor:in) / Feng, P. X. (Autor:in)
MATERIALS LETTERS ; 62 ; 1547-1550
01.01.2008
4 pages
Aufsatz (Zeitschrift)
Englisch
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