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Effect of substrate temperature variation on nanostructured WC films prepared using HFCVD technique
Effect of substrate temperature variation on nanostructured WC films prepared using HFCVD technique
Effect of substrate temperature variation on nanostructured WC films prepared using HFCVD technique
Yang, B. Q. (author) / Wang, X. P. (author) / Zhang, H. X. (author) / Wang, Z. B. (author) / Feng, P. X. (author)
MATERIALS LETTERS ; 62 ; 1547-1550
2008-01-01
4 pages
Article (Journal)
English
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