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Evaluation of Si3N4/Si interface by UV Raman spectroscopy
Evaluation of Si3N4/Si interface by UV Raman spectroscopy
Evaluation of Si3N4/Si interface by UV Raman spectroscopy
Ogura, A. (Autor:in) / Yoshida, T. (Autor:in) / Kosemura, D. (Autor:in) / Kakemura, Y. (Autor:in) / Aratani, T. (Autor:in) / Higuchi, M. (Autor:in) / Sugawa, S. (Autor:in) / Teramoto, A. (Autor:in) / Ohmi, T. (Autor:in) / Hattori, T. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 6229-6231
01.01.2008
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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