Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008): Fid-Bau Portal

Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Ofir, Y. / Samanta, B. / Xiao, Q. / Jordan, B. J. / Xu, H. / Arumugam, P. / Arvizo, R. / Tuominen, M. T. / Rotello, V. M.

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Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Ofir, Y. / Samanta, B. / Xiao, Q. / Jordan, B. J. / Xu, H. / Arumugam, P. / Arvizo, R. / Tuominen, M. T. / Rotello, V. M.

Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Ofir, Y. / Samanta, B. / Xiao, Q. / Jordan, B. J. / Xu, H. / Arumugam, P. / Arvizo, R. / Tuominen, M. T. / Rotello, V. M.

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Titel:

Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Beteiligte:

Ofir, Y. (Autor:in) / Samanta, B. (Autor:in) / Xiao, Q. (Autor:in) / Jordan, B. J. (Autor:in) / Xu, H. (Autor:in) / Arumugam, P. (Autor:in) / Arvizo, R. (Autor:in) / Tuominen, M. T. (Autor:in) / Rotello, V. M. (Autor:in)