Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008): Fid-Bau Portal

Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Ofir, Y. / Samanta, B. / Xiao, Q. / Jordan, B. J. / Xu, H. / Arumugam, P. / Arvizo, R. / Tuominen, M. T. / Rotello, V. M.

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Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Ofir, Y. / Samanta, B. / Xiao, Q. / Jordan, B. J. / Xu, H. / Arumugam, P. / Arvizo, R. / Tuominen, M. T. / Rotello, V. M.

Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Ofir, Y. / Samanta, B. / Xiao, Q. / Jordan, B. J. / Xu, H. / Arumugam, P. / Arvizo, R. / Tuominen, M. T. / Rotello, V. M.

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Title:

Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)

Contributors:

Ofir, Y. (author) / Samanta, B. (author) / Xiao, Q. (author) / Jordan, B. J. (author) / Xu, H. (author) / Arumugam, P. (author) / Arvizo, R. (author) / Tuominen, M. T. (author) / Rotello, V. M. (author)