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Atomistic nitriding processes of titanium thin films due to nitrogen-implantation
Atomistic nitriding processes of titanium thin films due to nitrogen-implantation
Atomistic nitriding processes of titanium thin films due to nitrogen-implantation
Kasukabe, Y. (Autor:in) / Nishida, S. (Autor:in) / Yamamoto, S. (Autor:in) / Yoshikawa, M. (Autor:in) / Fujino, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 7942-7946
01.01.2008
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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