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    Atomistic nitriding processes of titanium thin films due to nitrogen-implantation

    New search for: Kasukabe, Y.
    New search for: Nishida, S.
    New search for: Yamamoto, S.
    New search for: Yoshikawa, M.
    New search for: Fujino, Y.

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    Atomistic nitriding processes of titanium thin films due to nitrogen-implantation

    New search for: Kasukabe, Y.
    New search for: Nishida, S.
    New search for: Yamamoto, S.
    New search for: Yoshikawa, M.
    New search for: Fujino, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atomistic nitriding processes of titanium thin films due to nitrogen-implantation

    New search for: Kasukabe, Y.
    New search for: Nishida, S.
    New search for: Yamamoto, S.
    New search for: Yoshikawa, M.
    New search for: Fujino, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Atomistic nitriding processes of titanium thin films due to nitrogen-implantation

    Contributors:

    Kasukabe, Y. (author) / Nishida, S. (author) / Yamamoto, S. (author) / Yoshikawa, M. (author) / Fujino, Y. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 254 ; 7942-7946

    Publication date:

    2008-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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