Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films: Fid-Bau Portal

Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Liu, Z.-z. / Wang, Q. / Liu, X. / Bao, J.-q.

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Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Liu, Z.-z. / Wang, Q. / Liu, X. / Bao, J.-q.

Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Liu, Z.-z. / Wang, Q. / Liu, X. / Bao, J.-q.

Zugriff

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Titel:

Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Beteiligte:

Liu, Z.-z. (Autor:in) / Wang, Q. (Autor:in) / Liu, X. (Autor:in) / Bao, J.-q. (Autor:in)

Erschienen in:

MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 26 ; 545-549

Erscheinungsdatum:

01.01.2008

Format / Umfang:

5 pages

ISSN:

1673-2812

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Unbekannt

Klassifikation:

DDC: 620.11

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