Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films: Fid-Bau Portal

Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Liu, Z.-z. / Wang, Q. / Liu, X. / Bao, J.-q.

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Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Liu, Z.-z. / Wang, Q. / Liu, X. / Bao, J.-q.

Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Liu, Z.-z. / Wang, Q. / Liu, X. / Bao, J.-q.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Contributors:

Liu, Z.-z. (author) / Wang, Q. (author) / Liu, X. (author) / Bao, J.-q. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 26 ; 545-549

Publication date:

2008-01-01

Size:

5 pages

ISSN:

1673-2812

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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