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Differential Hall characterisation of ultrashallow doping in advanced Si-based materials
Differential Hall characterisation of ultrashallow doping in advanced Si-based materials
Differential Hall characterisation of ultrashallow doping in advanced Si-based materials
Bennett, N. S. (Autor:in) / Cowern, N. E. (Autor:in) / Smith, A. J. (Autor:in) / Kah, M. (Autor:in) / Gwilliam, R. M. (Autor:in) / Sealy, B. J. (Autor:in) / Noakes, T. C. (Autor:in) / Bailey, P. (Autor:in) / Giubertoni, D. (Autor:in) / Bersani, M. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 154-155 ; 229-233
01.01.2008
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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