A platform for research: civil engineering, architecture and urbanism
Differential Hall characterisation of ultrashallow doping in advanced Si-based materials
Differential Hall characterisation of ultrashallow doping in advanced Si-based materials
Differential Hall characterisation of ultrashallow doping in advanced Si-based materials
Bennett, N. S. (author) / Cowern, N. E. (author) / Smith, A. J. (author) / Kah, M. (author) / Gwilliam, R. M. (author) / Sealy, B. J. (author) / Noakes, T. C. (author) / Bailey, P. (author) / Giubertoni, D. (author) / Bersani, M. (author)
MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 154-155 ; 229-233
2008-01-01
5 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Ultrashallow Hydrogen-Like Thermal Donors in Silicon Crystals
British Library Online Contents | 1993
|Ultrashallow profiling of semiconductors by secondary ion mass spectrometry
British Library Online Contents | 2001
|A correction to the nanoindentation technique for ultrashallow indenting depths
British Library Online Contents | 2007
|Rapid solidification of plasma sprayed advanced materials: nanostructure characterisation
British Library Online Contents | 2004
|Rapid solidification of plasma sprayed advanced materials: nanostructure characterisation
British Library Online Contents | 2004
|