Towards chemical state resolution in regularized depth profiles derived from ARXPS data taken on plasma-oxidized polystyrene: Fid-Bau Portal

Towards chemical state resolution in regularized depth profiles derived from ARXPS data taken on plasma-oxidized polystyrene

Paynter, R. W.

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Towards chemical state resolution in regularized depth profiles derived from ARXPS data taken on plasma-oxidized polystyrene

Paynter, R. W.

Towards chemical state resolution in regularized depth profiles derived from ARXPS data taken on plasma-oxidized polystyrene

Paynter, R. W.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

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Dokumentinformationen

Titel:

Towards chemical state resolution in regularized depth profiles derived from ARXPS data taken on plasma-oxidized polystyrene

Beteiligte:

Paynter, R. W. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 255 ; 8738-8742

Erscheinungsdatum:

01.01.2009

Format / Umfang:

5 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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