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Comparison of implantation and diffusion behavior of Ti, Sb and N in ion-implanted single crystal and polycrystalline ZnO: A SIMS study
Comparison of implantation and diffusion behavior of Ti, Sb and N in ion-implanted single crystal and polycrystalline ZnO: A SIMS study
Comparison of implantation and diffusion behavior of Ti, Sb and N in ion-implanted single crystal and polycrystalline ZnO: A SIMS study
Lee, J. (Autor:in) / Metson, J. (Autor:in) / Evans, P. J. (Autor:in) / Pal, U. (Autor:in) / Bhattacharyya, D. (Autor:in)
APPLIED SURFACE SCIENCE ; 256 ; 2143-2146
01.01.2010
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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