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    Comparison of implantation and diffusion behavior of Ti, Sb and N in ion-implanted single crystal and polycrystalline ZnO: A SIMS study

    New search for: Lee, J.
    New search for: Metson, J.
    New search for: Evans, P. J.
    New search for: Pal, U.
    New search for: Bhattacharyya, D.

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    Comparison of implantation and diffusion behavior of Ti, Sb and N in ion-implanted single crystal and polycrystalline ZnO: A SIMS study

    New search for: Lee, J.
    New search for: Metson, J.
    New search for: Evans, P. J.
    New search for: Pal, U.
    New search for: Bhattacharyya, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Comparison of implantation and diffusion behavior of Ti, Sb and N in ion-implanted single crystal and polycrystalline ZnO: A SIMS study

    New search for: Lee, J.
    New search for: Metson, J.
    New search for: Evans, P. J.
    New search for: Pal, U.
    New search for: Bhattacharyya, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Comparison of implantation and diffusion behavior of Ti, Sb and N in ion-implanted single crystal and polycrystalline ZnO: A SIMS study

    Contributors:

    Lee, J. (author) / Metson, J. (author) / Evans, P. J. (author) / Pal, U. (author) / Bhattacharyya, D. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 256 ; 2143-2146

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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