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Effect of temperature and silicon resistivity on the elaboration of silicon nanowires by electroless etching
Effect of temperature and silicon resistivity on the elaboration of silicon nanowires by electroless etching
Effect of temperature and silicon resistivity on the elaboration of silicon nanowires by electroless etching
Fellahi, O. (Autor:in) / Hadjersi, T. (Autor:in) / Maamache, M. (Autor:in) / Bouanik, S. (Autor:in) / Manseri, A. (Autor:in)
APPLIED SURFACE SCIENCE ; 257 ; 591-595
01.01.2010
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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